NX2600 Recipes

Nanoimprint

Thermal Imprint Recipe

• Pumping time: 1-2 min.
• Pre-imprint temperature: 120 ºC
• Pre-imprint pressure: 120 psi
• Imprint temperature: 120 ºC
• Imprint pressure: 200 psi
• Imprint process time: 1 min.
• Venting temp: 50 ºC
• Wafer area: 6-inch
• Imprint resist: NXR-1025

UV Imprint Recipe

• Pumping time: 1-2 min.
• Pre-imprint pressure: 100 psi
• Imprint pressure: 200 psi
• UV curing process time: 10-60 sec.
• Venting temp: 50 ºC
• Wafer area: 4-inch
• Imprint pattern: 200 nm pitch grating
• Imprint resist: NXR-2010/ NXR-3022