QNF Spinner Operating Procedure

Updated on 3/24/2016

The control panel

• The picture shows a starting screen.
• The recipe cannot be saved.

Contents

1 Check-in

2 Load Sample

3 Edit Process

3.1 Set Step Number

3.2 Set Process in Each Step

3.3 Procedure of Spinner for E-beam Resist

4 Run

5 Unload the sample

6 Clean the spinner

7 Finishing up

8 Check-out

1. Check-in

1. Login Spinner on the scheduler of the IRIS system before use. 

2. Load Sample

1. Open a lid.

2. Install a wafer chuck.

3. Place a wafer (sample) on the chuck.

4. Press the "Wafer Vacuum" button on the control panel, and "NO VAC" disappears on the starting screen.

3. Edit Process

3.1 Set Step Number

1. Press the "Scroll Up" button.

2. Press the "Change Item" button, and the item will be highlighted.

3. Enter the step number.

4. Press the "Enter" button.

3.2 Set Process in Each Step

1. Press the "Scroll Up" button.

2. Press the "Change Item" button, and the "Speed Preset" will be highlighted.

3. Enter the spin speed.

4. Press the "Enter" button.

5. Press the "Change Item" button, and the "Dwell Preset" will be highlighted.

6. Enter the spinning time.

7. Press the "Enter" button.

8. Press the "Scroll Up" button to go to the next page.

9. Set up the parameters in the next step.

• Note: The acceleration is fixed, depending on the spinner.
  • Three spinner bench: 500 rpm/sec (right), 1000 rpm/sec (middle), 2000 rpm/sec (left)
  • Two spinner bench: 500 rpm/sec (right), 1000 rpm/sec (left).

3.3 Procedure of Spinner for E-beam Resist

Note: Procedure of the spinner for E-beam resist is different from other spinners.

1. Set up parameters in the step(s), as shown above.

2. Set the timers on all other steps, which are not used, to be zero. 

• If you use the step 1 only, then you MUST set the timers on the steps 2-10 to be zero.  Otherwise, the spinner will not stop.

3. Press "F2" button to reset the spinner before every run to ensure that spin parameters are correctly set in the system.

4. Run

1. Press the "Scroll Down" button to go back to the starting screen.

2. Step on the pedal to start the process.

5. Unload the sample

1. Open the lid after the process.

2. Remove the wafer (sample) from the chuck.

• The wafer vacuum is turned off automatically.

6. Clean the spinner

1. Clean the spinner.

2. Remove the chuck from the spinner.

• Use acetone with clean room wipes to remove all traces of coating material from the chuck(s), bowl, and lid. Do not spray directly onto the sample chuck or shaft.

7. Finishing up

1. Close the lid.

8. Check-out

1. Logout Spinner on the scheduler of the IRIS system after use. 

Revision

3/24/2016, by Hiro, Procedure of Spinner for E-beam Resist was added.