A-Si/SiO2/Si wafer

• Assume that a-Si/SiO2/Si wafer was measured.
• Tip:
  1. Use tabulated n and k for Si and SiO2
  2. Use Gen-Osc for the a-Si layer.–(a-Si.mat as reference)
  3. Fit thickness of layers
  4. Fit thickness and Gen-Osc Parameter of layers.

1. Build up the model layers

1. AddLayer "si_jaw.mat" as the substrate in the Model window.

2. AddLayer "sio2_jaw.mat" as the tabulated SiO2 layer in the Model window. Check a fit box of thickness.

3. AddLayer "a-Si_Palik.mat" as the tabulated a-Si layer in the Model window. Check a fit box of thickness.

4. AddLayer "sio2.mat" again as the tabulated SiO2 layer, which is an oxide layer on a-Si, in the Model window.

5. The following dialog box appears. Click "Yes".

• Note: When the same name of model layer is input, this message appears.

6. Check a fit box of thickness in the coupled layer window.

7. Adjust the thicknesses of SiO2 and a-Si layers close to the graph curves (in this case, ~300 nm for SiO2 layer and ~350 nm for a-Si layer).

2. Normal Fit

1. Do Normal fit in the Fit window, to fit the thicknesses only.

2. The MSE is 37.09.

3. General Oscillator Model Fitting

1. Convert the a-Si layer to General Oscillator model layer.

2. Fit e2 first, and then fit e1 in the GenOsc layer window. Click "OK".

3. Make sure that the fit boxes of the thicknesses in all of the model layers are checked.

4. Do Normal fit in the Fit window.

5. The MSE is improved to be 1.764.