The Standard Operating Procedures of Wet Benches

Updated on 11/2/2015

Contents

1 Bay 2

1.1 Strip Bench

1.1.1 Sonicator

1.1.2 DI water sink

2 Bay 3

2.1 Acid Bench

2.1.1 Acid Bench 1

2.1.2 Acid Bench 2

2.1.3 Discarding Waste Acid Solution

2.2 Base Bench

2.2.1 Discarding Waste Base Solution

2.3 Organic Solvent Bench

2.4 HF Bench

2.4.1 Discarding Waste HF Solution

2.5 Electroplating Bench

3 Bay 4

3.1 Spinner Bench and Developing for E-beam Lithography

3.1.1 Develop Sample

3.1.2 Discarding Waste Developing Solution

4 Bay 5

4.1 Spinner Benches for UV Lithography

4.2 Develop Bench

4.2.1 Develop Sample

4.2.2 Discarding Waste Developing Solution

4.3 Organic Solvent Bench

5. Soft Lithography Room

5.1 Spinner Bench for Soft Lithography

 

Note:

1. Bay 2

1.1. Strip Bench

1.1.1 Sonicator

1.1.2 DI water sink

 

Note:

2. Bay 3

2.1. Acid Bench

2.1.1 Acid Bench 1

    

    

2.1.2 Acid Bench 2

    

2.1.3 Discarding Waste Acid Solution

  1. Turn on the aspirator.
  2. Use the tip of the aspirator to remove the waste acid solution.
  3. Rinse the tip of the aspirator with DI water when finished.
  4. Rinse the glassware with DI water.

2.2. Base Bench

2.2.1 Discarding Waste Base Solution

  1. Turn on the aspirator.
  2. Use the tip of the aspirator to remove the waste base solution.
  3. Rinse the tip of the aspirator with DI water when finished.
  4. Rinse the glassware with DI water.

2.3 Organic Solvent Bench

 

Note:

2.4. HF Bench

 

2.4.1 Discarding Waste HF Solution

  1. Turn on the aspirator.
  2. Use the tip of the aspirator to remove the waste HF solution.
  3. Rinse the tip of the aspirator with DI water when finished. 
  4. Rinse the glassware with DI water.

2.5 Electroplating Bench

3. Bay 4

3.1 Spinner Bench and Developing for E-beam Lithography

Note:

3.1.1 Develop Sample

  1. Prepare a developing solution (a mixed solution of MIBK:IPA=1:3 vol%). 
  2. After e-beam exposure, immerse the substrate in the developing solution, according to the recipe.  Agitate the solution, if necessary.
  3. Rinse the substrate with IPA. 
  4. Dry the substrate using the nitrogen gun.

3.1.2 Discarding Waste Developing Solution

  1. Discard the waste MIBK and IPA solution in the cup sink. 

4. Bay 5

4.1. Spinner Benches for UV Lithography

Note:

      

4.2. Develop Bench

4.2.1 Develop Sample

  1. Prepare a developing solution. 
  2. After exposure, immerse the substrate in the developing solution, according to the recipe.  Agitate the solution, if necessary.
  3. Rinse the substrate with DI water, using the DI water gun or spray basket.
  4. Dry the substrate using the nitrogen gun.

4.2.2 Discarding Waste Developing Solution

  1. Turn on the aspirator.
  2. Use the tip of the aspirator to remove the waste developing solution.
  3. Rinse the tip of the aspirator with DI water when finished. 
  4. Rinse the glassware with DI water.

    

    

4.3. Organic Solvent Bench

Note:

    

5. Soft Lithography Room

5.1 Spinner Bench for Soft Lithography

  1. The SOP of the spinner is posted on Spinners.
  2. Clean the spinner after use using acetone and wipes.

Note: